Design for CD correction strategy using a resist shrink method via UV irradiation for defect-free photomaskJIN HO RYU; DONG WOOK LEE; HO YONG JUNG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67300K.1-67300K.10, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

The advanced mask CD MTT control using dry etch process for sub 65 nm techSANG JIN JO; HO YONG JUNG; DONG WOOK LEE et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673008.1-673008.8, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Mask CD correction method using dry etch processHO YONG JUNG; TAE JOONG HA; JAE CHEON SHIN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 63490B.1-63490B.9, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

Effect of UV/O₃ treatment on mask surface to reducing sulfuric residue ionsDONG WOOK LEE; HO YONG JUNG; MUN SIK KIM et al.SPIE proceedings series. 2004, pp 521-528, isbn 0-8194-5513-X, 2Vol, 8 p.Conference Paper